Abstract

Monitoring surfaces during plasma treatment is important both for device processing and understanding basic plasma chemistry. In situ techniques offer the advantage of real-time analysis allowing instant feedback during process development and control. Additionally, removal of the substrate from the plasma is not required as in ex situ diagnostics thereby ensuring that the surface composition has not changed. We have developed two in situ surface diagnostics, photoemission optogalvanic spectroscopy (POGS) and second harmonic generation (SHG), to monitor real time changes on surfaces in contact with plasmas.

© 1989 Optical Society of America