Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > MSBA > 1985 > MB > MB5

Laser Interferometry and Laser Induced Fluorescence Studies of Laser Etching

R.W. Dreyfus, R. Walkup, and J.M. Jasinski

Not Accessible

Your library or personal account may give you access

Abstract

Excimer laser ablation of solids with laser power densities in the range 106 to 109 W/cm2 is becoming increasingly important in laser processing of materials for microelectronics. The ablation process produces an intense plume of gas phase material which expands rapidly away from the ablated surface. We report on real time interferometric measurements of free electron density and laser induced fluorescence studies of atoms and molecules in the plume, with the objective of understanding the dynamics of material ablation.

© 1985 Optical Society of America

PDF Article
More Like This
Direct probe tor plasma formation during excimer laser ablation of materials

R. WALKUP, J. M. JASINSKI, and R. W. DREYFUS
FQ1 Conference on Lasers and Electro-Optics (CLEO:S&I) 1985

Ultraviolet Laser Etching: Diatomic Temperatures by Laser-Induced Fluorescence Measurements

R. W. Dreyfus, R. E. Walkup, Roger Kelly, and R. Srinivasan
ThD1 Lasers in Material Diagnostics (LMD) 1987

Energy distributions of atoms and molecules produced by laser ablation

R. W. DREYFUS, J. M. JASINSKI, R. WALKUP, and R. KELLY
FQ2 Conference on Lasers and Electro-Optics (CLEO:S&I) 1985

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use