Abstract

Photodeposition involves use of UV, visible, or IR radiation to assist or enhance a chemical reaction that results in the formation of a thin film on a given substrate. This presentation covers various aspects of UV laser-assisted deposition. Properties of some of the photodeposited films, which include conducting, insulating, and semiconductor films, are presented and their properties compared with those obtained via conventional means. Finally, the advantages and limitations of this deposition technique are discussed.

© 1986 Optical Society of America