Abstract
EUV lithography promises to be the next, and maybe the last technology to extend Moore's Law fabrication of computer chips. We review the development, status and challenges this technology faces as it nears implementation.
© 2009 Optical Society of America
PDF ArticleMore Like This
D. L. Windt and W. K. Waskiewicz
EC.47 Extreme Ultraviolet Lithography (EUL) 1994
Masaaki Ito, Souichi Katagiri, Hiromasa Yamanashi, Eiichi Seya, Taro Ogawa, Hiroaki Oizumi, and Tsuneo Terasawa
EWW9 Extreme Ultraviolet Lithography (EUL) 1996
Andrew M. Hawryluk and Natale M. Ceglio
ELPM.13 Extreme Ultraviolet Lithography (EUL) 1994