Holey metalens focusing of extreme ultraviolet light

M. Ossiander; M. Ossiander; M.L. Meretska; H.K. Hampel; S.W.D. Lim; N. Knefz; T. Jauk; F. Capasso; M. Schultze

doi:10.1364/FLATOPTICS.2023.FTh3G.3

Optica Imaging Congress (3D, COSI, DH, FLatOptics, IS, pcAOP)
Technical Digest Series (Optica Publishing Group, 2023),
paper FTh3G.3
•https://doi.org/10.1364/FLATOPTICS.2023.FTh3G.3

Holey metalens focusing of extreme ultraviolet light

M. Ossiander, M.L. Meretska, H.K. Hampel, S.W.D. Lim, N. Knefz, T. Jauk, F. Capasso, and M. Schultze

Flat Optics: Components to Systems 2023

Boston, Massachusetts United States
14–17 August 2023
ISBN: 978-1-957171-28-9

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Metasurface-Based Emerging Applications II (FTh3G)

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M. Ossiander, M. L. Meretska, H. K. Hampel, S. W. D. Lim, N. Knefz, T. Jauk, F. Capasso, and M. Schultze, "Holey metalens focusing of extreme ultraviolet light," in Optica Imaging Congress (3D, COSI, DH, FLatOptics, IS, pcAOP), Technical Digest Series (Optica Publishing Group, 2023), paper FTh3G.3.

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Abstract

Manipulating light in the extreme ultraviolet wavelength range is challenging due to a limited number of suitable optical materials. In this work, we demonstrate a silicon holey metalens to focus 50-nm wavelength light.

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