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Conferences > EUL > 1994 > SEL > SEL.238

High Average Power Solid-State Laser for EUV Lithography

Mark Hermann, John Honig, and Lloyd Hackel

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Abstract

A diode-pumped, solid-state laser has recently been activated in the Extreme Ultraviolet Lithography (EUVL) facility at Lawrence Livermore National Laboratory. The purpose of this report is to document the design, operation, current laser operating points, and future upgrades of the EUVL laser system.

© 1994 Optical Society of America

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