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Optica Publishing Group
  • European Quantum Electronics Conference
  • Technical Digest Series (Optica Publishing Group, 1998),
  • paper QTuD7

Atom lithography in two-dimensional polarization gradient light fields

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Abstract

Using neutral atoms for lithography is a new method of generating nanostructures on a substrate. This method is based on light masks formed by interfering laser beams perpendicular to the atomic beam. One- and two-dimensional periodic structures have been fabricated by various groups [1] using light masks with intensity gradients and uniform polarization. The resulting periods are half the laser wavelength or greater.

© 1998 IEEE

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