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Conferences > CLEO_SI > 2023 > SM2H > SM2H.2

Low-temperature and hydrogen-free silicon dioxide cladding for integrated photonics

Zheru Qiu, Zihan Li, Rui Ning Wang, and Tobias J. Kippenberg

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Abstract

We demonstrate a hydrogen-free low-loss silicon oxide film deposited with SiCl4 and O2 precursor. A very wide low-loss window of 1300 nm to 1620 nm is achieved at deposition temperature as low as 300°C.

© 2023 The Author(s)

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