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Conferences > CLEO_SI > 2020 > SW4E > SW4E.4

Large-area Flat Optics via Immersion Lithography on CMOS Platform for Laser Beam Shaping

Yuan Hsing Fu, Nanxi Li, Lei Chen, Qize Zhong, Yuan Dong, Dongdong Li, Zhengji Xu, Ting Hu, Yanyan Zhou, Keng Heng Lai, Min Zhu, Shiyang Zhu, Qunying Lin, Shengdi Huang, and Navab Singh

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Abstract

We report a large-area metasurface beam shaper via 12-inch immersion lithography CMOS platform. A3 × 3 mm2 metasurface beam shaper is designed to transfer a Gaussian intensity distribution to a Top-Hat intensity distribution.

© 2020 The Author(s)

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