Abstract
Third harmonic microscopy is applied to determine nonlinear susceptibilities of thin films and image nascent, laser incubated, and laser damaged dielectric coatings with unprecedented contrast. The relative contribution of signals from the film and its surroundings is analyzed.
© 2012 Optical Society of America
PDF ArticleMore Like This
E.M. Kim, R.V. Kapra, T.V. Murzina, and O.A. Aktsipetrov
IMQ2 International Quantum Electronics Conference (IQEC) 2004
D. Stoker, J. Baek, M. C. Downer, D. Kovar, M. F. Becker, and J. W. Keto
FME4 Frontiers in Optics (FiO) 2005
R. I. Woodward, R. T. Murray, C. F. Phelan, R. E. P. de Oliveira, S. Li, G. Eda, and C. J. S. de Matos
STu1R.3 CLEO: Science and Innovations (CLEO:S&I) 2016