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Conferences > CLEO_SI > 2016 > STu1R > STu1R.3

Characterization of the Nonlinear Susceptibility of Monolayer MoS2 using Second- and Third-Harmonic Generation Microscopy

R. I. Woodward, R. T. Murray, C. F. Phelan, R. E. P. de Oliveira, S. Li, G. Eda, and C. J. S. de Matos

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Abstract

Second- and third-harmonic generation microscopy of monolayer MoS2 is reported for imaging and characterization of the material’s nonlinearity. A telecommunication wavelength pump is used, revealing the material’s promise for use in nonlinear optical devices.

© 2016 Optical Society of America

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