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Conferences > CLEO_AT > 2023 > JTh2A > JTh2A.134

Comparison of Soft and Hard Mask for Fabrication of High Q SiN Microring Resonators

Lala Rukh, Gabriel Colacion, and Tara Drake

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Abstract

This work reports two robust methods for fabrication of high-quality factor (Q) SiN resonators using a polymer-based mask and a metallic mask. We compare the etch uniformity, sidewall quality, and quality factors of the fabricated waveguides and resonators.

© 2023 The Author(s)

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