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Plasma-etched GaAs optomechanical microdisks fabricated with an electro-lithographic soft mask

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Abstract

A method to fabricate GaAs optomechanical single and coupled microdisks using only a soft electrolithographic mask and inductive coupled plasma etching is presented. Optical quality factors of Qopt ~ 1.2 × 105 are achieved.

© 2018 The Author(s)

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