The Deepest Subwavelength LIPSS on ZnO by Reduction of the Damage Threshold

Yaoyao Liu; Qiang Wu; Jianghong Yao; Jingjun Xu

doi:10.1364/CLEO_AT.2021.ATh1R.5

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2021),
paper ATh1R.5
•https://doi.org/10.1364/CLEO_AT.2021.ATh1R.5

The Deepest Subwavelength LIPSS on ZnO by Reduction of the Damage Threshold

Yaoyao Liu, Qiang Wu, Jianghong Yao, and Jingjun Xu

CLEO: Applications and Technology 2021

San Jose, California United States
9–14 May 2021
ISBN: 978-1-943580-91-0

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Micro, Nano Fabrication and 3D Printing (ATh1R)

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Y. Liu, Q. Wu, J. Yao, and J. Xu, "The Deepest Subwavelength LIPSS on ZnO by Reduction of the Damage Threshold," in Conference on Lasers and Electro-Optics, J. Kang, S. Tomasulo, I. Ilev, D. Müller, N. Litchinitser, S. Polyakov, V. Podolskiy, J. Nunn, C. Dorrer, T. Fortier, Q. Gan, and C. Saraceno, eds., OSA Technical Digest (Optica Publishing Group, 2021), paper ATh1R.5.

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Abstract

The smallest spatial period of LIPSS on ZnO monocrystal was achieved through metal/ZnO heterointerface assisted femtosecond laser processing. Simultaneously, the damage threshold of ZnO was decreased by 54% due to the metal film coating.

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