A Compact Dual-wavelength Optical Head for Photo-lithography

Yuan-Chin Lee; Yuan-Chin Lee; Shiuh Chao; Chun-Chieh Huang; Shuen-Chen Chen; Chung-Ta Cheng

2013 Conference on Lasers and Electro-Optics Pacific Rim
(Optica Publishing Group, 2013),
paper WPE_17

A Compact Dual-wavelength Optical Head for Photo-lithography

Yuan-Chin Lee, Shiuh Chao, Chun-Chieh Huang, Shuen-Chen Chen, and Chung-Ta Cheng

Conference on Lasers and Electro-Optics/Pacific Rim 2013

Kyoto Japan
30 June–4 July 2013
ISBN: 978-1-4673-6475-1

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POSTER SESSION - WEDNESDAY (WPE)

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Y. Lee, S. Chao, C. Huang, S. Chen, and C. Cheng, "A Compact Dual-wavelength Optical Head for Photo-lithography," in 2013 Conference on Lasers and Electro-Optics Pacific Rim, (Optica Publishing Group, 2013), paper WPE_17.

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Abstract

A dual-wavelength optical head with an NA0.85 objective lens for lithography was developed. Both 405nm and 650nm are integrated in this optical head. It can be used to expose both organic and in-organic photo-resists and meanwhile performing focusing servo.

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