Abstract

Photochemical surface modifications of silicone ([SiO(CH3)2]n) rubber have been successfully demonstrated by using various UV pulsed lasers; a 157-nm F2 laser, and a 193-nm ArF, and by using the 266-nm fourth harmonic of a Nd:YAG laser. The F2 laser modified silicone into transparent silica (SiO2). By switching the light source from a F2 laser to an ArF excimer laser or to the fourth harmonic of a Nd:YAG laser, we could modify the surface of the silicone rubber into a photoluminescent material or into amorphous carbon, respectively. Based on the photochemical modifications, micron-sized silica optical waveguides and white light sources could be integrated into a silicone rubber chip.

© 2009 IEEE

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