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Optica Publishing Group
  • Conference on Lasers and Electro-Optics/Pacific Rim 2007
  • (Optica Publishing Group, 2007),
  • paper WA3_3

Laterally varying porous silicon optical tunable filter fabricated using a tapered etch mask pattern

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Abstract

We fabricated a laterally varying porous silicon (pSi) Fabry-Perot tunable filter by employing the spatially graded pSi etch technique through a tapered etch mask pattern. Reflectance measurements revealed that the tuning range can be made as wide as -100 nm while the typical transmission bandwidth is ~3 nm in the 1550 nm wavelength range.

© 2007 IEEE

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