Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • Conference on Lasers and Electro-Optics/Pacific Rim 2007
  • (Optica Publishing Group, 2007),
  • paper ThF1_2

Size Reduction Technology of SOI-based Nano-waveguides

Not Accessible

Your library or personal account may give you access

Abstract

Based on conventional lithography and anisotropic etching of Si, a size reduction technology is proposed to achieve low-loss nano-scale optical waveguides in silicon-on-insulator (SOI), which would find abroad applications in highly-integrated optical interconnects and integrated photonic circuits.

© 2007 IEEE

PDF Article
More Like This
A Technological Process of Coupling, Alignment and Packaging of Optical Fiber based on Nano-SOI Waveguide

Rui Xiao, Liangqiu Zhu, Qingzhong Huang, and Jinsong Xia
AS3F.6 Asia Communications and Photonics Conference (ACP) 2016

Reduction of Bending Loss for the TM mode in a strip-waveguide using a metamaterial in SOI-based platform

Claudia M. Serpa-Imbett and Hugo E. Hernandez-Figueroa
LTu2A.3 Latin America Optics and Photonics Conference (LAOP) 2016

Low loss SOI-based high-mesa waveguides fabricated using neutral loop discharge (NLD) plasma etching for compact breath-sensing system

Satoshi Yano, Kosuke Kameyama, and Kiichi Hamamoto
IWA7 Integrated Photonics and Nanophotonics Research and Applications (IPR) 2007

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved