Ion-Beam Sputtered TiO2-SiO2 Mixed Films for Thin Film Filter in DWDM Application

Shiuh Chao

The 4th Pacific Rim Conference on Lasers and Electro-Optics
Technical Digest Series (Optica Publishing Group, 2001),
paper P1_75

Ion-Beam Sputtered TiO₂-SiO₂ Mixed Films for Thin Film Filter in DWDM Application

Shiuh Chao

Conference on Lasers and Electro-Optics/Pacific Rim 2001

Chiba Japan
15–19 July 2001
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Poster Session 1 [Room E] (P1)

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S. Chao, "Ion-Beam Sputtered TiO2-SiO2 Mixed Films for Thin Film Filter in DWDM Application," in The 4th Pacific Rim Conference on Lasers and Electro-Optics, Technical Digest Series (Optica Publishing Group, 2001), paper P1_75.

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Abstract

TiO₂-SiO₂ mixed films were produced with ion beam sputter method. The refractive index of the mixed film were higher than that of the conventional Ta₂O₅ films. Calculations show that bandwidth of the thin films filters composed of the mixed films were significantly reduced.

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