Abstract

Hologram microlens are becoming standard optical components with current applications in optical communications, optical computing and optoelectronic integrated circuits (OEICs). The fabrication of diffractive lens using the deposition of thin dielectric films was first demonstrated by d'Auria et al.¹ Currently, most high resolution microlens are fabricated by electron-beam and deep-UV lithography. In this paper, New method of fabricating hologram zone plate were proposed by using Field-Associated Etching (FAE) technology.

© 1995 IEEE