Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • The Pacific Rim Conference on Lasers and Electro-Optics
  • Technical Digest Series (Optica Publishing Group, 1995),
  • paper P84

Reduction of particles in a-Si films deposited by laser ablation

Not Accessible

Your library or personal account may give you access

Abstract

Laser ablation provides a unique means to deposit a variety of thin films, but micron-size particles are normally mixed in deposits. The particle problem is in particular serious for deposition of amorphous silicon (a-Si) films. In this work, we made attempts to obtain particle-free a-Si thin films by laser ablation.

© 1995 IEEE

PDF Article
More Like This
Fabrication of Organic Thin Films by Laser Ablation Deposition for Electro-Optics Devices

Takeo Fujii, Hiroki Shima, Naotaka Matsumoto, and Fumihiko Kannari
MD.7 Organic Thin Films for Photonic Applications (OTF) 1995

Fabrication of organic thin films by laser ablation deposition

T. Fujii, H. Shima, N. Matsumoto, and F. Kannari
P85 Conference on Lasers and Electro-Optics/Pacific Rim (CLEO/PR) 1995

Deposition of fluoropolymer thin films containing semiconductor microcrystallities by VUV laser ablation

S. Inoue, T. Fujii, and F. Kannari
ThN4 Conference on Lasers and Electro-Optics/Pacific Rim (CLEO/PR) 1995

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.