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Conferences > BGPPM > 2022 > JTu2A > JTu2A.33

Investigation into multi-pass exposure of 213 nm pulsed UV writing for improved writing response

Q. Salman Ahmed, James W. Field, Paul C. Gow, Christopher Holmes, Rex H.S. Bannerman, Paolo L. Mennea, Corin B. E. Gawith, Peter G.R. Smith, and James C. Gates

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Abstract

We demonstrate an increase in achievable refractive index change of 1.2×10-3 in Gedoped silica in writing waveguides and gratings using pulsed 213 nm light to deposit the same total fluence over multiple writing passes.

© 2022 The Author(s)

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