Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • 2019 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference
  • OSA Technical Digest (Optica Publishing Group, 2019),
  • paper ck_8_3

Integrated waveguides and Bragg gratings UV written with 213nm light

Not Accessible

Your library or personal account may give you access

Abstract

Direct UV writing is capable of fabricating low-loss channel waveguides, couplers and Bragg gratings in planar silica by translation through a focused UV beam. Devices are typically fabricated using 244nm laser light, relying on the photosensitivity provided by doping to induce sufficient refractive index change necessary to form waveguides. However, these devices also require hydrogen and deuterium loading prior to writing to induce sufficient refractive index change to form waveguides [1]. Hydrogenation not only requires additional processing but over time the hydrogen present within the silica depletes, which can cause variation of the final written structures. Deep UV light at 213 nm has previously been used to inscribe strong fibre Bragg gratings (FBGs) in hydrogen-free Ge-doped fibres achieving an index change of 1.2×10−3 [2]. Here we present the first use of a 213 nm UV laser to induce index change sufficient to simultaneously define waveguides and Bragg gratings in planar silica without hydrogenation. This would potentially allow writing of large area or two-dimensional devices without variation due to outgassing.

© 2019 IEEE

PDF Article
More Like This
Direct UV Written Integrated Planar Waveguides Fabricated with 213nm Light

Paul C. Gow, Rex H.S. Bannerman, Christopher Holmes, James C. Gates, and Peter G.R. Smith
CE_P_25 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2017

Direct 213 nm UV written Bragg gratings and waveguides in planar silica without hydrogen loading

Q.S. Ahmed, P.C. Gow, P.L. Mennea, R.H.S. Bannerman, D.H. Smith, C. Holmes, J.C. Gates, and P.G.R. Smith
IW2A.4 Integrated Photonics Research, Silicon and Nanophotonics (IPR) 2020

Photosensitivity response of pulsed 213 nm light in planar Bragg grating writing

Q. Salman Ahmed, James W. Field, Paul C. Gow, Swe Zin Oo, Christopher Holmes, Rex H.S. Bannerman, Paolo L. Mennea, Corin B. E. Gawith, Peter G.R. Smith, and James C. Gates
BM3A.6 Bragg Gratings, Photosensitivity and Poling in Glass Waveguides and Materials (BGPP) 2022

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved