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A Yellow InGaP Light Emitting Diode Epitaxially Grown on Si Substrate

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Abstract

A yellow InGaP light emitting diode (LED) emitting at 590 nm epitaxially grown on Si substrate with SiGe and GaAsP buffer layers is demonstrated. Characterizations of the epitaxy growth and device fabrication are presented.

© 2015 Optical Society of America

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