Fabricating micro/nano-structures on small substrates is a challenging work when using standard optical lithography technique with spin-coated photoresist for patterning. In order to solve this problem, we produce silicon hard masks (220 nm in thickness) based on silicon-on-insulator (SOI) membrane samples. These suspended masks can be easily transferred on to other small target substrates like a diamond plate as demonstrated in this work, which are useful for further applications as hard masks for pattern etching or hybrid photonic integration.

© 2015 Optical Society of America

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