Abstract

Fabricating micro/nano-structures on small substrates is a challenging work when using standard optical lithography technique with spin-coated photoresist for patterning. In order to solve this problem, we produce silicon hard masks (220 nm in thickness) based on silicon-on-insulator (SOI) membrane samples. These suspended masks can be easily transferred on to other small target substrates like a diamond plate as demonstrated in this work, which are useful for further applications as hard masks for pattern etching or hybrid photonic integration.

© 2015 Optical Society of America

PDF Article

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription