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Low-threshold AlGaN-based deep ultraviolet laser enabled by a nanoporous cladding layer

Yongming Zhao, Liqiong Deng, Feng Wu, Zhihua Zheng, Pengcheng Jian, Weijie Liu, Zhenyu Chen, Shizhou Tan, Meng Peng, Wei Guo, Changqing Chen, and Jiangnan Dai

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Abstract

We demonstrated an AlGaN-based multiple-quantum-well (MQW) deep ultraviolet (DUV) laser at 278 nm using a nanoporous (NP) n-AlGaN as the bottom cladding layer grown on the sapphire substrate. The laser has a very-low-threshold optically pumped power density of 79 kW/cm2 at room temperature and a transverse electric (TE)-polarization-dominant emission. The high optical confinement factor of 9.12% benefiting from the low refractive index of the nanoporous n-AlGaN is the key to enable a low-threshold lasing. The I–V electrical measurement demonstrates that an ohmic contact can be still achieved in the NP n-AlGaN with a larger but acceptable resistance, which indicates it is compatible with electrically driven laser devices. Our work provides insights into the design and fabrication of low-threshold lasers emitting in the DUV regime.

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