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Extending plasmonic response to the mid-wave infrared with all-epitaxial composites

Abstract

Highly doped semiconductor “designer metals” have been shown to serve as high-quality plasmonic materials across much of the long-wavelength portion of the mid-infrared. These plasmonic materials benefit from a technologically mature semiconductor fabrication infrastructure and the potential for monolithic integration with electronic and photonic devices. However, accessing the short-wavelength side of the mid-infrared is a challenge for these designer metals. In this work we study the perspectives for extending the plasmonic response of doped semiconductors to shorter wavelengths by leveraging charge confinement, in addition to doping. We demonstrate, theoretically and experimentally, negative permittivity across the technologically vital mid-wave infrared (3–5 $\mathrm{\mu}$m) frequency range. The semiconductor composites presented in our work offer an ideal material platform for monolithic integration with a variety of semiconductor optoelectronic devices operating in the mid-wave infrared.

© 2022 Optica Publishing Group

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Supplementary Material (1)

NameDescription
Supplement 1       Calculation method and details

Data availability

Data underlying the results presented in this paper are not publicly available at this time but may be obtained from the authors upon reasonable request. The numerical models used to calculate permittivity of highly doped semiconductors are available in Ref. [33].

33. GitHub, 2022, https://github.com/EvanSimmonsUML/BallisticMetamaterials.

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