Abstract
We demonstrate a reflective wavefront sensor grating suitable for the characterization of high-quality x-ray beamlines and optical systems with high power densities. Operating at glancing incidence angles, the optical element is deeply etched with a two-level pattern of shearing interferometry gratings and Hartmann wavefront sensor grids. Transverse features block unwanted light, enabling binary amplitude in reflection with high pattern contrast. We present surface characterization and soft x-ray reflectometry of a prototype grating array to demonstrate function prior to wavefront measurement applications. A simulation of device performance is shown.
© 2020 Optical Society of America
Full Article | PDF ArticleMore Like This
Kenneth A. Goldberg
Opt. Lett. 46(4) 729-732 (2021)
Pascal Mercère, Mourad Idir, Thierry Moreno, Gilles Cauchon, Guillaume Dovillaire, Xavier Levecq, Laurent Couvet, Samuel Bucourt, and Philippe Zeitoun
Opt. Lett. 31(2) 199-201 (2006)
Wilhelm Eschen, Getnet Tadesse, Yufei Peng, Michael Steinert, Thomas Pertsch, Jens Limpert, and Jan Rothhardt
Opt. Lett. 45(17) 4798-4801 (2020)