Abstract

Subject of study. This study examines the influence of Mo metal concentration on the properties of As₃S₇ films when exposed to continuous laser radiation. Aim of study. This study aims to investigate the impact of Mo metal concentration on the photodarkening and photoresist properties of As₃S₇ films. Method. The photodarkening process was performed by subjecting the films to continuous radiation with a wavelength of 445 nm. The transmission spectra of the samples were measured using a fiber spectrophotometer. The surface of the films was examined using an optical microscope. To assess the photoresist effect, radiation with a wavelength of 532 nm was employed, along with a solvent comprising a solution of C₈H₁₉N in C₆H₅CN. Main results. The degree of photodarkening decreased with increasing Mo concentration. In the original film, a 10% decrease in transmission was observed, whereas, at the highest metal concentration, the change in transmission approached zero. Additionally, the study demonstrates that the ratio of the solubility rates of exposed to unexposed films decreases at higher metal concentrations. Practical significance. The results of this study hold practical significance in the development of devices that utilize changes in the phase state of chalcogenide glass films.

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