Abstract

Using optical "sitall" (glass-ceramic) as an example, the possibility of the shaping (aspherization) of a surface using a self-contained ion source is considered. It is shown that, when aspheric surfaces are obtained with asphericity of up to 13 µm, the optical quality of the processed surface is maintained, and the surface microrelief does not exceed 4 Å.

Comparison of the smoothing and shaping of optics by plasma-assisted chemical etching and ion milling using the surface evolution theory

C. B. Zarowin
Appl. Opt. 32(16) 2984-2991 (1993)

Influence of ion-beam etching by Ar ions with an energy of 200–1000 eV on the roughness and sputtering yield of a single-crystal silicon surface

M. S. Mikhailenko, A. E. Pestov, N. I. Chkhalo, M. V. Zorina, A. K. Chernyshev, N. N. Salashchenko, and I. I. Kuznetsov
Appl. Opt. 61(10) 2825-2833 (2022)

Roughness measurement and ion-beam polishing of super-smooth optical surfaces of fused quartz and optical ceramics

N. I. Chkhalo, S. A. Churin, A. E. Pestov, N.N. Salashchenko, Yu. A. Vainer, and M. V. Zorina
Opt. Express 22(17) 20094-20106 (2014)

Deterministic ion beam material adding technology for high-precision optical surfaces

Wenlin Liao, Yifan Dai, Xuhui Xie, and Lin Zhou
Appl. Opt. 52(6) 1302-1309 (2013)

Combination of reaction ion etching and dynamic chemical etching for improving laser damage resistance of fused silica optical surfaces

Laixi Sun, Jin Huang, Hongjie Liu, Xin Ye, Jingjun Wu, Xiaodong Jiang, Liming Yang, Wanguo Zheng, and Weidong Wu
Opt. Lett. 41(19) 4464-4467 (2016)