Abstract

SiO ${}_{{{x}}}$ (1 < x < 2) thin films for potential application as a core of submicrometer optical waveguides were deposited by thermal evaporation of SiO. The optical properties of the films were modified during the deposition process, tuning the refractive index between 1.5 and 2. Some propagation characteristics of the optical slab waveguides such as optical modes effective indices, intensity distribution profiles, and propagation losses were measured and compared to theoretical calculations. Our results show the viability of SiO ${}_{{{x}}}$ as a core material for submicrometer waveguides in the visible and near-infrared spectra.

© 2016 IEEE

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