Abstract

Multiple passes, both within a semiconductor specimen and between the specimen surface and the interferometer, give rise to a series of extraneous "tertiary" interferograms in a Fourier transform spectrophotometer. These tertiary interferograms can lead to a possible error on the order of 1% in the measurement of the impurity content of a silicon wafer. However, this effect can be eliminated by a straightforward manipulation of the interferogram prior to transformation.

Methodology for computing Fourier-transform infrared spectroscopy interferograms

B. N. Carnio, O. Moutanabbir, and A. Y. Elezzabi
Appl. Opt. 62(17) 4518-4523 (2023)

Smearing of interferograms in Fourier transform spectroscopy

Thomas G. Kyle and Ronald Blatherwick
Appl. Opt. 23(2) 261-263 (1984)

Effect of interferogram smearing on atmospheric limb sounding by Fourier transform spectroscopy

Jae H. Park
Appl. Opt. 21(8) 1356-1366 (1982)

Distortion free interferograms in Fourier transform spectroscopy with nonlinear detectors

Guy Guelachvili
Appl. Opt. 25(24) 4644-4648 (1986)

Fast surface profiling by spectral analysis of white-light interferograms with Fourier transform spectroscopy

Matthew Hart, David G. Vass, and Mark L. Begbie
Appl. Opt. 37(10) 1764-1769 (1998)