Abstract
Surface analysis techniques such as ion scattering spectroscopy (ISS) and secondary ion mass spectroscopy (SIMS) use a beam of inert ions of approximately 0.5 to 3.0 ke V energy to slowly sputter away the surface of a solid material. The energy of the scattered ion is then measured (ISS) or the mass spectrum is recorded for the sputtered ionic species (SIMS) to provide an elemental profile analysis.
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