2022 Optical Interference Coatings Conference: Manufacturing Problem Contest [Invited]

Daniel Poitras; Penghui Ma; Michael R. Jacobson; Catherine C. Cooksey; Luke J. Sandilands; Stacey Lee

doi:10.1364/AO.477250

Applied Optics
Vol. 62,
Issue 7,
pp. B104-B111
(2023)
•https://doi.org/10.1364/AO.477250

2022 Optical Interference Coatings Conference: Manufacturing Problem Contest [Invited]

Daniel Poitras, Penghui Ma, Michael R. Jacobson, Catherine C. Cooksey, Luke J. Sandilands, and Stacey Lee

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
Daniel Poitras, Penghui Ma, Michael R. Jacobson, Catherine C. Cooksey, Luke J. Sandilands, and Stacey Lee, "2022 Optical Interference Coatings Conference: Manufacturing Problem Contest [Invited]," Appl. Opt. 62, B104-B111 (2023)

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Citation alert
Save article

Check for updates

Abstract

Participants in the 2022 Manufacturing Problem Contest were challenged to fabricate an optical filter with a specified stepped transmittance spanning three orders of magnitude from 400 to 1100 nm. The problem required that contestants be versed in the design, deposition, and measurement of optical filters to achieve good results. Nine samples from five institutions were submitted with total thicknesses between 5.9 and 53.5 µm with between 68 and 1743 layers. The filter spectra were measured by three independent laboratories. The results were presented in June 2022 at the Optical Interference Coatings Conference in Whistler, B.C., Canada.

Full Article | PDF Article

More Like This

2019 Topical Meeting on Optical Interference Coatings: Manufacturing Problem Contest [invited]

Daniel Poitras, Li Li, Michael R. Jacobson, and Catherine C. Cooksey
Appl. Opt. 59(5) A31-A39 (2020)

Broadband transmission filters from the 2013 Optical Interference Coatings manufacturing problem contest [Invited]

Li Li, J. A. Dobrowolski, Michael Jacobson, and Catherine Cooksey
Appl. Opt. 53(4) A248-A258 (2014)

Manufacturing problem contest [invited]

Daniel Poitras, Li Li, Michael Jacobson, and Catherine Cooksey
Appl. Opt. 56(4) C1-C10 (2017)

Previous Article Next Article

Data availability

Data underlying the results presented in this paper (Fig. 1 and Figs. 4–14), are available in Ref. [9].

9. D. Poitras, P. Ma, M. Jacobson, C. Cooksey, L. Sandilands, and S. Lee, “Supplement information for the 2022 OIC Manufacturing Problem Contest,” figshare (2022), https://doi.org/10.6084/m9.figshare.21651353.

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Figures (14)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Tables (3)

You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Equations (1)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Teams	Affiliation	Tools and Comments
Janis Zideluns, Fabien Lemarchand, Detlef Arhilger, Giulia Fiaschi, Navas Illyaskutty, Harro Hagedorn and Julien Lumeau	Institut Fresnel, Bühler Leybold Optics	Bühler HELIOS PARMS
Marc Lappschies, Jan Brossmann, Stefan Jakobs, and Matthias Frank	Materion Balzers Optics	Bühler-Helios400 PARMS; optical broadband monitoring; one re-optimization; traces of copper-oxide contamination
Andy Shkabko	Viavi Solutions	Magnetron sputtering; manufacturing simulation
Neil Pinkerton	Viavi Solutions	Magnetron sputtering; manufacturing simulation
Vladimir Pervak	Ludwig Maximilians University	Dual middle frequency plasma assisted magnetron sputtering;
Vladimir Pervak	Ultrafast Innovations	Dual middle frequency plasma assisted magnetron sputtering; ${Nb}_{2} O_{5} / {SiO}_{2}$

	Information from Participants				Information from Evaluation Labs
Sample	Nb. Layers (Front + Back Coatings)	TOTAL Thickness (nm)	MF Design	MF Meas.	MF ODA	MF NIST	MF Metro	MF Ave.	Rank
N01	559 + 0	40671	2.26	4.47	$7.393$	$4.730$	$4.796$	$5.64$	3
N02	68 + 0	8267	6.50	6.80	$6.874$	$6.825$	$6.774$	$6.82$	5
N03	370 + 0	25591	4.66	5.83	$6.214$	$5.937$	$5.849$	$6.00$	4
N04	1285 + 0	39432	1.80	2.66	$5.096$	$Broken$	$2.929$	$4.01$	2
N05	193 + 0	15690	3.95	11.65	$15.821$	$16.742$	$16.591$	$16.38$	8
N06	107 + 0	8698	5.68	22.08	$40.600$	$44.027$	$44.578$	$43.07$	9
N07	159 + 0	12716	4.44	10.56	$15.337$	$15.957$	$15.742$	$15.68$	7
N08	1743 + 0	53511	1.36	2.61	$\bf 4.17$	$2.80$	$2.65$	$3.21$	1
N09	81 + 0	5994	6.89	12.37	$13.201$	$13.745$	$13.686$	$13.54$	6

	ODA	NIST	Metro
Instrument	Cary 5000	Perkin-Elmer Lambda 1050	Perkin-Elmer Lambda 900
Beams	Double-grating and double-beam	Double-beam	Double-beam
Wavelength range	$400 - 1100 nm$ , $1.0 nm$ step, 2 nm bandpass	$400 - 1100 nm$ , $1.0 nm$ step, 2 nm bandpass	$400 - 1100 nm$ , $1.0 nm$ step, 2 nm bandpass
Light source	Tungsten-halogen/deuterium	Tungsten-halogen/deuterium	Tungsten-halogen/deuterium
Detectors	Photomultiplier/PbS	Photomultiplier/InGaAs	Photomultiplier/PbS
Transmittance accuracy	$\pm 0.2 %$ in VIS and NIR	$\pm 0.6 %$ in VIS and NIR	$\pm 0.2 %$ in VIS and NIR

Teams	Affiliation	Tools and Comments
Janis Zideluns, Fabien Lemarchand, Detlef Arhilger, Giulia Fiaschi, Navas Illyaskutty, Harro Hagedorn and Julien Lumeau	Institut Fresnel, Bühler Leybold Optics	Bühler HELIOS PARMS
Marc Lappschies, Jan Brossmann, Stefan Jakobs, and Matthias Frank	Materion Balzers Optics	Bühler-Helios400 PARMS; optical broadband monitoring; one re-optimization; traces of copper-oxide contamination
Andy Shkabko	Viavi Solutions	Magnetron sputtering; manufacturing simulation
Neil Pinkerton	Viavi Solutions	Magnetron sputtering; manufacturing simulation
Vladimir Pervak	Ludwig Maximilians University	Dual middle frequency plasma assisted magnetron sputtering;
Vladimir Pervak	Ultrafast Innovations	Dual middle frequency plasma assisted magnetron sputtering; ${Nb}_{2} O_{5} / {SiO}_{2}$

	Information from Participants				Information from Evaluation Labs
Sample	Nb. Layers (Front + Back Coatings)	TOTAL Thickness (nm)	MF Design	MF Meas.	MF ODA	MF NIST	MF Metro	MF Ave.	Rank
N01	559 + 0	40671	2.26	4.47	$7.393$	$4.730$	$4.796$	$5.64$	3
N02	68 + 0	8267	6.50	6.80	$6.874$	$6.825$	$6.774$	$6.82$	5
N03	370 + 0	25591	4.66	5.83	$6.214$	$5.937$	$5.849$	$6.00$	4
N04	1285 + 0	39432	1.80	2.66	$5.096$	$Broken$	$2.929$	$4.01$	2
N05	193 + 0	15690	3.95	11.65	$15.821$	$16.742$	$16.591$	$16.38$	8
N06	107 + 0	8698	5.68	22.08	$40.600$	$44.027$	$44.578$	$43.07$	9
N07	159 + 0	12716	4.44	10.56	$15.337$	$15.957$	$15.742$	$15.68$	7
N08	1743 + 0	53511	1.36	2.61	$\bf 4.17$	$2.80$	$2.65$	$3.21$	1
N09	81 + 0	5994	6.89	12.37	$13.201$	$13.745$	$13.686$	$13.54$	6

Abstract

Data availability

Cited By

Figures (14)

Tables (3)

Equations (1)

Applied Optics