Quantitative elemental analysis of bismuth brass with target-enhanced orthogonal double-pulse LIBS combined with variant one-point calibration

S. L. Chen; R. H. Li; Y. Q. Chen

doi:10.1364/AO.492394

Applied Optics
Vol. 62,
Issue 17,
pp. 4512-4517
(2023)
•https://doi.org/10.1364/AO.492394

Quantitative elemental analysis of bismuth brass with target-enhanced orthogonal double-pulse LIBS combined with variant one-point calibration

S. L. Chen, R. H. Li, and Y. Q. Chen

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S. L. Chen, R. H. Li, and Y. Q. Chen, "Quantitative elemental analysis of bismuth brass with target-enhanced orthogonal double-pulse LIBS combined with variant one-point calibration," Appl. Opt. 62, 4512-4517 (2023)

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Abstract

Self-absorption and unknown transition probabilities of the analytical lines hinder the accurate quantitative elemental analysis of bismuth brass with conventional calibration-free laser-induced breakdown spectroscopy (LIBS). In this work, target-enhanced orthogonal double-pulse LIBS combined with a variant one-point calibration method was used to solve this problem and realize quantitative elemental analysis of bismuth brass with a relative error of less than 4%. This approach is able to reduce the influence of self-absorption and capable of using analytical lines with unknown transition probabilities while using a calibration-free algorithm, which is helpful for accurate quantitative elemental analysis of bismuth brass and other samples.

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No data were generated or analyzed in the presented research.

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Sample No.	Concentrations (%)
Sample No.	Cu	Zn	Sn	Bi
1	61.46	33.07	1.10	0.26
2	61.48	35.31	0.58	0.95
3	61.34	35.16	0.28	0.48

Species	$λ$ (nm)	$A_{ki}$ ( $s^{- 1}$ )	$g_{k}$	$E_{k}$ (eV)
Cu I	282.44	$7.80 \times 10^{6}$	6	5.78
Cu I	296.12	$3.76 \times 10^{6}$	8	5.57
Cu I	427.51	$3.45 \times 10^{7}$	8	7.74
Cu I	458.70	$3.20 \times 10^{7}$	6	7.80
Cu I	465.11	$3.80 \times 10^{7}$	8	7.74
Cu I	510.55	$2.00 \times 10^{6}$	4	3.82
Cu I	515.32	$6.00 \times 10^{7}$	4	6.20
Cu I	521.82	$7.50 \times 10^{7}$	6	6.20
Cu I	529.25	$1.09 \times 10^{7}$	8	7.75

Analytical Line (nm)	$P$ ( $s^{- 1}$ )	Analytical Line (nm)	$P$ ( $s^{- 1}$ )
Cu I 282.44	$1.73 \times 10^{7}$	Cu I 529.25	$1.26 \times 10^{8}$
Cu I 296.12	$1.12 \times 10^{7}$	Sn I 317.50	$4.43 \times 10^{8}$
Cu I 427.51	$2.25 \times 10^{8}$	Sn I 326.23	$9.39 \times 10^{8}$
Cu I 458.70	$1.84 \times 10^{8}$	Zn I 468.01	$4.60 \times 10^{7}$
Cu I 510.55	$8.88 \times 10^{6}$	Zn I 472.22	$1.19 \times 10^{8}$
Cu I 515.32	$1.49 \times 10^{8}$	Zn I 481.05	$1.57 \times 10^{8}$
Cu I 521.82	$2.23 \times 10^{8}$	Bi I 306.77	$4.27 \times 10^{8}$

		Concentration (%)
Sample No.	Element	Analyzed	Certified	Relative Error (%)
2	Cu	62.48	61.48	1.64
	Zn	34.31	35.31	−2.83
	Sn	0.59	0.58	1.72
	Bi	0.93	0.95	−2.11
3	Cu	62.02	61.34	1.12
	Zn	34.47	35.16	−1.96
	Sn	0.29	0.28	3.57
	Bi	0.48	0.49	−2.04

Sample No.	Concentrations (%)
Sample No.	Cu	Zn	Sn	Bi
1	61.46	33.07	1.10	0.26
2	61.48	35.31	0.58	0.95
3	61.34	35.16	0.28	0.48

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Applied Optics