Abstract

Normal incidence optical anisotropies are monitored during the growth of dielectric and metal films deposited at 45° by logging the quantities R, R, T and T as functions of mass thickness d. For both ZrO2 and Ti2O3, the experimental profile of (RR) vs d is consistent with a refractive anisotropy that remains nearly constant during deposition. Gold, silver, and aluminum (deposited in the absence of oxygen) are shown to exhibit characteristic anisotropy vs d profiles that can be associated with the refractive index resonance in a globular metal film. The anisotropic effects observed in metals, both during deposition and during subsequent argon-ion sputter etching, are modeled by considering the film to comprise a mixture of crystallite- and void-defined materials and by adopting simplified structural hysteresis loops.

© 1991 Optical Society of America

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