Abstract

A method for depositing patterned infrared thin film spectral filters directly onto substrates at low temperatures (20°C) is described. Energetic deposition methods (ion-assisted and laser-assisted) were used to avoid heating the substrates, while a multilayer photoresist lift-off technique was applied to pattern the structures. The process produced durable films capable of surviving harsh processing conditions. This is a promising method for depositing patterned coatings directly onto infrared focal plane detector arrays.

© 1989 Optical Society of America

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