Abstract

Bragg reflector fabrication techniques on SiO2–Si3N4–SiO2 rib waveguides on Si are developed and optimized. Wafer preparation, holographic exposure, and pattern transfer techniques necessary to obtain uniform low-loss gratings have been developed. Phase drifts due to the effect of air density fluctuations during holographic exposure of the amplitude division interference type were studied and removed. These improvements enabled high quality Bragg reflectors over 5 cm (2 in.) in diameter to be reproducibly fabricated.

© 1988 Optical Society of America

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