Abstract
The influence of argon gas pressure (0.15–40 Pa) on the refractive indices n,k of dc planar-magnetron reactively sputtered cermet and amorphous semiconductor films has been investigated for a layer thickness of ~50 nm. Stainless steel–carbon and amorphous hydrogenated carbon layers with relatively low index n and stainless steel–silicon and amorphous hydrogenated silicon layers with relatively high index n are examined with a view to solar selective surface applications. The development of structural porosity with associated reduction in n for layers deposited at high argon pressure significantly improves the solar absorptance of surfaces incorporating stainless steel–silicon or amorphous hydrogenated silicon layers.
© 1983 Optical Society of America
Full Article | PDF ArticleMore Like This
M. F. Lambrinos, R. Valizadeh, and J. S. Colligon
Appl. Opt. 35(19) 3620-3626 (1996)
David R. Mills and L. C. Botten
Appl. Opt. 22(20) 3182-3190 (1983)
H. Demiryont, James R. Sites, and Kent Geib
Appl. Opt. 24(4) 490-495 (1985)