Abstract
The optical near field and its polarization anisotropy in transparent nanostructures were studied by polarization near-field optical microscopy. From experimental results and finite-difference time-domain calculations, we conclude that localized optical near fields exist at topographically higher regions of nanostructures under the TE-polarization condition. Optical near fields with a feature size smaller than are applied for contact photomask lithography. We demonstrate photolithographic patterns with width by using a helium cadmium laser.
© 2006 Optical Society of America
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