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Short optical pulses, in the range of 100 fs, allow to reach high excitation intensity, of the order of several tens of GW/cm2, with at the same time low levels of energy deposition, of the order of a few hundreds of nanojoules. This situation is favorable to escape thermal effects (at low repetition rates) and to be faster than most of the electronic processes which occur when using long lasting light pulses.
© 1996 Optical Society of America
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