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Conferences > QELS > 2008 > QWA > QWA6
  • Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference and Photonic Applications Systems Technologies
  • OSA Technical Digest (CD) (Optica Publishing Group, 2008),
  • paper QWA6

Fabrication of Channel and Wedge Plasmon Polarition Devices by Combined UV and Nanoimprint Lithography

Rasmus B. Nielsen, Alexandra Boltasseva, Anders Kristensen, Sergey I. Bozhevolnyi, Valentyn S. Volkov, Irene Fernandez Cuesta, and Anna Klukowska

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Abstract

We present a large-scale compatible fabrication method for channel and wedge plasmon polariton waveguides. Optical characterization of fabricated devices using SNOM shows sub-wavelength confinement and propagation lengths in the hundreds of microns.

© 2008 Optical Society of America

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