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Stress Characteristics in Periodic Multilayer Structures for X-Ray Optics

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Abstract

Sputtered x-ray multilayers usually exhibit the presence of intrinsic stress in the structures. Stress in multilayer mirrors are undesirable in many x-ray optical applications where flat mirrors, or precise control of curved mirrors, are designed. Controlling of the stress in these multilayers requires understanding of stress characteristics in multilayers and thin films.

© 1994 Optical Society of America

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