ALD Derived Conformal High Reflective Coatings at 266 nm

Dimitri Zielke; Henrik Ehlers; Wolfgang Ebert; Jue Wang; Paul Michaloski

doi:10.1364/OIC.2022.ME.2

Optical Interference Coatings Conference (OIC) 2022
Technical Digest Series (Optica Publishing Group, 2022),
paper ME.2
•https://doi.org/10.1364/OIC.2022.ME.2

ALD Derived Conformal High Reflective Coatings at 266 nm

Dimitri Zielke, Henrik Ehlers, Wolfgang Ebert, Jue Wang, and Paul Michaloski

Optical Interference Coatings 2022

Whistler, British Columbia Canada
19–24 June 2022
ISBN: 978-1-957171-04-3

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D. Zielke, H. Ehlers, W. Ebert, J. Wang, and P. Michaloski, "ALD Derived Conformal High Reflective Coatings at 266 nm," in Optical Interference Coatings Conference (OIC) 2022, R. Sargent and A. Sytchkova, eds., Technical Digest Series (Optica Publishing Group, 2022), paper ME.2.

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Abstract

We deposited HfO₂/SiO₂ based high reflective (HR) coating at 266 nm over a hemispherical surface via atomic layer deposition. We assessed the HR coating performance on 2D and 3D optics in the deep-ultraviolet spectral region.

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