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Characteristics of SiOxFy Thin Films Prepared by Ion Beam Assisted Deposition

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Abstract

As low refractive index materials in visible wavelength SiO2, MgF2, and Na3AlF6 have been used in the optical thin film coatings. While MgF2 and Na3AlF6 films have lower refractive index than SiO2 films, their mechanical properties are not as good as SiO2 films. On the other hand, in the semiconductor industry fluorine-doped SiO2 (SiOxFy) films prepared by the CVD method have been developed as an inorganic low-dielectric constant material.[1] In this study, we fabricated SiOxFy films by ion beam assisted deposition (IBAD) to utilize them in the optical coatings as a low index material with a better mechanical property and investigated the optical, mechanical, chemical properties of SiOxFy films.

© 1998 Optical Society of America

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