Intrinsic Stress in Mixtures of Fluoride Thin Films

Scott McEldowney; Lindsey Brown

doi:10.1364/OIC.1995.ThA2

Optical Interference Coatings
Technical Digest Series (Optica Publishing Group, 1995),
paper ThA2
•https://doi.org/10.1364/OIC.1995.ThA2

Intrinsic Stress in Mixtures of Fluoride Thin Films

Scott McEldowney and Lindsey Brown

Optical Interference Coatings 1995

Tucson, Arizona United States
5–9 June 1995
ISBN:

From the session
Materials: 1 (ThA)

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
S. McEldowney and L. Brown, "Intrinsic Stress in Mixtures of Fluoride Thin Films," in Optical Interference Coatings, Technical Digest Series (Optica Publishing Group, 1995), paper ThA2.

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Citation alert
Save article

Abstract

In the construction of thin film interference filters, It is necessary to have materials with various indices of refraction. Thorium fluoride (ThF₄) is an excellent material for use from the near ultraviolet to the far infrared spectral range. It has a low index of refraction, moderate stress in thin film form (20kpsi)(1), and it is environmentally very robust. The primary disadvantage of using ThF₄ is its radioactivity.

PDF Article

More Like This

Stresses and optical constants in BaF2-PrF3 thin films deposited using electron-beam evaporation

Ping Xie, Bin Li, Xuwen Lv, Weixiang He, and Dingquan Liu
JTu2A.20 Bragg Gratings, Photosensitivity and Poling in Glass Waveguides and Materials (BGPP) 2018

Reduction of Stress in Cerous Fluoride Films

S.F. Pellicori
WD2 Optical Interference Coatings (OIC) 1984

Intrinsic Stress in Sputter Deposited Thin Films

Henry Windischmann
OFA2 Optical Interference Coatings (OIC) 1992

Previous Article Next Article