Abstract

Many research results show that Ion-Assisted Deposition technique has good result in the improvement of film character, film microstructure, stress state and surface state. Many films with new function can be got. Since the IAD technique was used, many specialists and engineers in China have been specializing in the IAD technique. They not only developed IAD technique, but also manufactured the series of ion sources for IAD. A lot of work about IAD process is explained in this paper. The experimental parameters and results are also listed.

© 1992 Optical Society of America