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Conferences > OIC > 1984 > ThC > ThC4

Ion Beam Sputtered Anti-Reflection Coatings of Fused Silica Substrates

Michael S. Perlmutter and Kenneth R. Martin

Open Access Open Access

Abstract

A low reflectivity anti-reflection coating for use at 633 nm has been developed for fused silica substrates. The coating is a simple two layer design using silicon dioxide and titanium dioxide as the low and high index material. The thin films have been produced by ion beam sputtering techniques.

© 1984 Optical Society of America

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