Abstract
The surface topography of optics for extreme ultraviolet lithography (EUVL) must be precisely controlled from spatial scales extending from the full aperture (~50mm) to the wavelength of illumination (~13nm), or 7 orders of magnitude. Measurement and control of an optical surface over this range of spatial scales is challenging. This paper will present bare-surface PSD surface descriptions over these spatial scales for state-of-the-art EUVL optics.
© 1996 Optical Society of America
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