An Ion Beam Figuring System for Medium-Sized Optics

A. Schindler; T. Hänsel; A. Nickel; H.-J. Thomas; F. Bigl

doi:10.1364/OFT.1994.OThB1

Optical Fabrication and Testing Workshop
Technical Digest Series (Optica Publishing Group, 1994),
paper OThB1
•https://doi.org/10.1364/OFT.1994.OThB1

An Ion Beam Figuring System for Medium-Sized Optics

A. Schindler, T. Hänsel, A. Nickel, H.-J. Thomas, and F. Bigl

Optical Fabrication and Testing 1994

Rochester, New York United States
6–9 June 1994
ISBN:

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Ion Milling (OThB)

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A. Schindler, T. Hänsel, A. Nickel, H. -. Thomas, and F. Bigl, "An Ion Beam Figuring System for Medium-Sized Optics," in Optical Fabrication and Testing Workshop, Technical Digest Series (Optica Publishing Group, 1994), paper OThB1.

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Abstract

Ion beam etching becomes more and more established in the development of high precision surface and thin film processing. Both the transfer of resist patterns with lateral micrometer and nanometer dimensions and the figuring of large surface areas with nanometer accuracy in depth scale can be realized by this method.

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